• DocumentCode
    1987734
  • Title

    A tight-binding study of channel modulation in atomic-scale Si:P nanowires

  • Author

    Hoon Ryu ; Sunhee Lee ; Weber, Bruce ; Mahapatra, Santanu ; Simmons, M.Y. ; Hollenberg, Lloyd C. L. ; Klimeck, Gerhard

  • Author_Institution
    Korea Inst. of Sci. & Technol. Inf., Daejeon, South Korea
  • fYear
    2013
  • fDate
    3-5 Sept. 2013
  • Firstpage
    77
  • Lastpage
    80
  • Abstract
    It has been well understood that ultrathin, highly P δ-doped Si (Si:P) nanowires are metallic at charge-neutrality (Ref. [5]). This work extends the scope of tight-binding modeling beyond charge-neutrality to examine the channel modulation of a 1.5nm wide, 1/4 monolayer(ML)-doped Si:P nanowire and its effect on the channel conductance. Subband-anticrossing plays a key role in the channel modulation, creating a local minimum in the ballistic conductance as the channel is occupied with more electrons. While the channel modulation causes a fluctuation in the conductance, nanowires still remain metallic boding well for their utility as potential interconnects.
  • Keywords
    electric admittance; monolayers; nanowires; phosphorus; silicon; Si:P; atomic-scale nanowires; ballistic conductance; channel conductance; channel modulation; charge neutrality; size 1.5 nm; subband-anticrossing; tight binding modeling; Atomic layer deposition; Dispersion; Electric potential; Electrostatics; Modulation; Nanowires; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices (SISPAD), 2013 International Conference on
  • Conference_Location
    Glasgow
  • ISSN
    1946-1569
  • Print_ISBN
    978-1-4673-5733-3
  • Type

    conf

  • DOI
    10.1109/SISPAD.2013.6650578
  • Filename
    6650578