DocumentCode
1987796
Title
Fabrication of uniform QPM device using negative multiple pulse poling method
Author
Choi, Ju Won ; Kang, Heejong ; Ko, Do-Kyeong ; Ro, Jung Hoon ; Yu, Nan Ei
Author_Institution
Grad. program of Photonics & Appl. Phys., Gwangju Inst. of Sci. & Technol., Gwangju, South Korea
fYear
2011
fDate
Aug. 28 2011-Sept. 1 2011
Firstpage
1914
Lastpage
1916
Abstract
We introduced a novel negative multiple pulse poling (NMP) method for uniform device fabrication of quasi-phase matching using an in-situ visualization system. Diffraction pattern analysis showed the duty ratio of 0.42, and the standard deviation of 0.02 which means the uniform quality of the whole poled area.
Keywords
lithium compounds; optical elements; optical fabrication; optical phase matching; photoresists; LiNbO3; diffraction pattern analysis; in-situ visualization system; negative multiple pulse poling method; quasiphase matching; uniform QPM device; uniform device fabrication; Crystals; Diffraction; Lithium niobate; Optical diffraction; Real time systems; Resists; Visualization;
fLanguage
English
Publisher
ieee
Conference_Titel
Quantum Electronics Conference & Lasers and Electro-Optics (CLEO/IQEC/PACIFIC RIM), 2011
Conference_Location
Sydney, NSW
Print_ISBN
978-1-4577-1939-4
Type
conf
DOI
10.1109/IQEC-CLEO.2011.6193843
Filename
6193843
Link To Document