DocumentCode
1988432
Title
Modeling the growth of thin SnO2 films using spray pyrolysis deposition
Author
Filipovic, Lado ; Selberherr, Siegfried ; Mutinati, Giorgio C. ; Brunet, Elise ; Steinhauer, Stephan ; Kock, Alexander ; Teva, Jordi ; Kraft, J. ; Siegert, Joerg ; Schrank, Franz ; Gspan, Christian ; Grogger, Werner
Author_Institution
Inst. for Microelectron., Tech. Univ. Wien, Vienna, Austria
fYear
2013
fDate
3-5 Sept. 2013
Firstpage
208
Lastpage
211
Abstract
The deposition of a thin tin oxide film allows for the manufacture of modern gas sensors to replace the bulky sensors of previous generations. Spray pyrolysis deposition is used to grow the required sensing thin films, as it can be seamlessly integrated into a standard CMOS processing sequence. A model for spray pyrolysis deposition is developed and implemented within the Level Set framework. The implementation allows for a seamless integration of multiple processing steps for the manufacture of smart gas sensor devices. From observations it was noted that spray pyrolysis deposition, when performed with a gas pressure nozzle, results in good step coverage, analogous to a CVD process. This is due to the liquid droplets evaporating prior to contact with the heated wafer surface and subsequently depositing on top of the exposed silicon in vapor form.
Keywords
chemical vapour deposition; gas sensors; pyrolysis; semiconductor growth; semiconductor thin films; spray coating techniques; thin film sensors; tin compounds; CVD process; Si; SnO2; bulky sensors; gas pressure nozzle; level set framework; liquid droplet evaporation; modern gas sensors; multiple processing steps; seamless integration; smart gas sensor devices; spray pyrolysis deposition; standard CMOS processing sequence; thin film sensing; tin oxide thin film growth modeling; wafer surface heating; Gas detectors; Level set; Semiconductor device modeling; Substrates; Surface treatment;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices (SISPAD), 2013 International Conference on
Conference_Location
Glasgow
ISSN
1946-1569
Print_ISBN
978-1-4673-5733-3
Type
conf
DOI
10.1109/SISPAD.2013.6650611
Filename
6650611
Link To Document