• DocumentCode
    1989368
  • Title

    Atomistic simulation of a III-V p-i-n junction: Comparison of density functional and tight-binding approaches

  • Author

    Stokbro, Kurt ; Blom, Arthur ; Smidstrup, Soren

  • Author_Institution
    QuantumWise A/S, Copenhagen, Denmark
  • fYear
    2013
  • fDate
    3-5 Sept. 2013
  • Firstpage
    380
  • Lastpage
    383
  • Abstract
    We compare the results of calculations based on tight-binding and density functional theory (DFT) for the description of an ultra-narrow two-dimensional (2D) InAs system. We first investigate the electronic structure of the 2D system to understand the effect of different surface terminations and how they are modeled using tight-binding and DFT approaches. We next set up a gated 2D InAs p-i-n junction and calculate the transistor characteristics of the system using the two different approaches.
  • Keywords
    III-V semiconductors; density functional theory; electronic structure; field effect transistors; indium compounds; semiconductor device models; semiconductor junctions; tight-binding calculations; III-V p-i-n junction; InAs; atomistic simulation; density functional theory; electronic structure; gated 2D InAs p-i-n junction; surface terminations; tight-binding approach; transistor characteristics; ultranarrow two-dimensional InAs system; Discrete Fourier transforms; Electric potential; Electrodes; Logic gates; Photonic band gap; Surface reconstruction; Tunneling; InAs; atomic-scale modeling; density functional theory; p-i-n junction; surface effects; tight-binding;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices (SISPAD), 2013 International Conference on
  • Conference_Location
    Glasgow
  • ISSN
    1946-1569
  • Print_ISBN
    978-1-4673-5733-3
  • Type

    conf

  • DOI
    10.1109/SISPAD.2013.6650654
  • Filename
    6650654