DocumentCode
1989368
Title
Atomistic simulation of a III-V p-i-n junction: Comparison of density functional and tight-binding approaches
Author
Stokbro, Kurt ; Blom, Arthur ; Smidstrup, Soren
Author_Institution
QuantumWise A/S, Copenhagen, Denmark
fYear
2013
fDate
3-5 Sept. 2013
Firstpage
380
Lastpage
383
Abstract
We compare the results of calculations based on tight-binding and density functional theory (DFT) for the description of an ultra-narrow two-dimensional (2D) InAs system. We first investigate the electronic structure of the 2D system to understand the effect of different surface terminations and how they are modeled using tight-binding and DFT approaches. We next set up a gated 2D InAs p-i-n junction and calculate the transistor characteristics of the system using the two different approaches.
Keywords
III-V semiconductors; density functional theory; electronic structure; field effect transistors; indium compounds; semiconductor device models; semiconductor junctions; tight-binding calculations; III-V p-i-n junction; InAs; atomistic simulation; density functional theory; electronic structure; gated 2D InAs p-i-n junction; surface terminations; tight-binding approach; transistor characteristics; ultranarrow two-dimensional InAs system; Discrete Fourier transforms; Electric potential; Electrodes; Logic gates; Photonic band gap; Surface reconstruction; Tunneling; InAs; atomic-scale modeling; density functional theory; p-i-n junction; surface effects; tight-binding;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices (SISPAD), 2013 International Conference on
Conference_Location
Glasgow
ISSN
1946-1569
Print_ISBN
978-1-4673-5733-3
Type
conf
DOI
10.1109/SISPAD.2013.6650654
Filename
6650654
Link To Document