DocumentCode :
1990245
Title :
Trap-Related Current Collapse Effects in GaN HEMTs
Author :
Ma, L. ; Wang, Y. ; Guo, T.Y. ; Lu, J. ; Hao, Z.B. ; Luo, Y. ; Yu, Z.P.
Author_Institution :
Institute of Mircoelectronics, Tsinghua University, Beijing, China, E-mail: mrdragon99@mails.tsinghua.edu.cn.
fYear :
2005
fDate :
19-21 Dec. 2005
Firstpage :
795
Lastpage :
798
Abstract :
The current collapse effects are investigated in GaN HEMTs by means of dc and dynamic measurements. The trapping-detrapping process is demonstrated by varying the hold time from 0.1s to 20s and the delay time from l0us to l00ms. The relevant time constant is more than ls. Our simulation result show that the gate-induced collapse is related both to the high surface state density and high vertical electric filed. New structures are simulated to demonstrate the advantages in reducing both gate-induced and buffer-induced collapse.
Keywords :
Aluminum gallium nitride; Analytical models; Buffer layers; Current measurement; Delay effects; Electron traps; Gallium nitride; HEMTs; MODFETs; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Solid-State Circuits, 2005 IEEE Conference on
Print_ISBN :
0-7803-9339-2
Type :
conf
DOI :
10.1109/EDSSC.2005.1635397
Filename :
1635397
Link To Document :
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