DocumentCode :
1992428
Title :
Design methodology for minimizing hysteretic V/sub T/-variation in partially-depleted SOI CMOS
Author :
Wei, A. ; Antoniadis, D.A.
Author_Institution :
Microsystems Technol. Lab., MIT, Cambridge, MA, USA
fYear :
1997
fDate :
10-10 Dec. 1997
Firstpage :
411
Lastpage :
414
Abstract :
This work demonstrates that switching-history-dependent threshold voltage variation can be minimized in partially-depleted SOI NMOS and PMOS devices by a device design which combines body-charge balance between logic states with minimum gate-body capacitive coupling and non-ideal body-source/drain diode behavior. This analysis also demonstrates that once the devices are charge-balanced supply voltage scaling naturally minimizes /spl Delta/V/sub T/.
Keywords :
CMOS logic circuits; delays; integrated circuit design; logic gates; silicon-on-insulator; body-charge balance; hysteretic V/sub T/-variation; logic states; minimum gate-body capacitive coupling; non-ideal body-source/drain diode behavior; partially-depleted SOI CMOS; supply voltage scaling; switching-history-dependent threshold voltage variation; Design methodology; Diodes; Doping profiles; Hysteresis; Impact ionization; Logic devices; Propagation delay; Pulse inverters; Pulse measurements; Switches;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1997. IEDM '97. Technical Digest., International
Conference_Location :
Washington, DC, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-4100-7
Type :
conf
DOI :
10.1109/IEDM.1997.650412
Filename :
650412
Link To Document :
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