DocumentCode :
1993656
Title :
Alpha-SER determination from word-line voltage margin (WVM) measurements: Design architecture and experimental results
Author :
Torrens, Gabriel ; de Paul, Ivan ; Alorda, Bartomeu ; Bota, Sebastia ; Segura, Jaume
Author_Institution :
Electron. Syst. Group (GSE-UIB), Univ. Illes Balears, Palma, Spain
fYear :
2013
fDate :
23-27 Sept. 2013
Firstpage :
1
Lastpage :
4
Abstract :
Experimental results from a 65nm CMOS commercial technology SRAM test chip reveal a high correlation between the word-line voltage margin (WVM)-defined as the difference between the memory nominal supply voltage and the lower mean voltage applied to the word-line capable of writing a cell - and the measured circuit alpha-SER. Additional experiments show that no other memory cell robustness-related parameters (like the minimum supply voltage during hold or read) exhibit such correlation. After an initial irradiation experiment on a reduced sample circuits, the WVM technique can be used to estimate the alpha-SER levels on each particular circuit without requiring additional irradiation experiments. The technique requires a specific memory design modification that does not degrade circuit performance while circuit area increase is negligible.
Keywords :
CMOS memory circuits; SRAM chips; radiation hardening (electronics); voltage measurement; CMOS commercial technology; SRAM test chip; WVM measurements; alpha-SER determination; lower mean voltage; measured circuit alpha-SER; memory cell; memory nominal supply voltage; size 65 nm; soft-error rate; word-line voltage margin measurements; CMOS integrated circuits; Computer architecture; Correlation; Microprocessors; Random access memory; Transistors; Voltage measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Radiation and Its Effects on Components and Systems (RADECS), 2013 14th European Conference on
Conference_Location :
Oxford
Type :
conf
DOI :
10.1109/RADECS.2013.6937452
Filename :
6937452
Link To Document :
بازگشت