Title :
Super-resolution nanolithography in photoreduction polymers
Author :
Gu, Min ; Li, Xiangping ; Cao, Yaoyu
Author_Institution :
Fac. of Eng. & Ind. Sci., Swinburne Univ. of Technol., Hawthorn, VIC, Australia
fDate :
Aug. 28 2011-Sept. 1 2011
Abstract :
In this paper we present our recent progress on far-field super-resolution enabled nanofabrication in photoreduction polymers. Pupil engineering and spatial photoinduction-inhibited methods will be employed to break the diffraction limit of the beam. The far-field super-resolution provides a revolutionary tool for three-dimensional (3D) imaging, lithography and optical storage.
Keywords :
light diffraction; nanolithography; optical polymers; 3D imaging; diffraction limit; far field super resolution enabled nanofabrication; optical storage; photoreduction polymers; pupil engineering; spatial photoinduction inhibited methods; super resolution nanolithography; Laser beams; Materials; Nanofabrication; Optical diffraction; Optical imaging; Spatial resolution;
Conference_Titel :
Quantum Electronics Conference & Lasers and Electro-Optics (CLEO/IQEC/PACIFIC RIM), 2011
Conference_Location :
Sydney, NSW
Print_ISBN :
978-1-4577-1939-4
DOI :
10.1109/IQEC-CLEO.2011.6194169
