DocumentCode :
1995549
Title :
Real-time, In Situ Monitoring Of Semiconductor Processing
Author :
Gottscho, Richard A. ; Aydil, Eray S. ; Giapis, Konstantinos P. ; Gregus, Jeffrey A. ; Euijoun Youn ; Hayes, Todd R. ; Vernon, Matthew F. ; Chakrabarti, U.K.
Author_Institution :
AT&T Bell Laboratories
fYear :
1992
fDate :
16-19 Nov 1992
Firstpage :
7
Lastpage :
8
Keywords :
Etching; Gallium arsenide; Monitoring; Passivation; Photoluminescence; Photonic band gap; Plasma applications; Plasma stability; Plasma temperature; Radiative recombination;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
LEOS '92, Conference Proceedings. IEEE Lasers and Electro-Optics Society, 1992 Annual Meeting
Print_ISBN :
0-7803-0526-4
Type :
conf
DOI :
10.1109/LEOS.1992.693817
Filename :
693817
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1995549
