DocumentCode
1995589
Title
Reflectance As A Thickness And Growth Rate Monitor For Chemical Vapor Deposition
Author
Breiland, W.G. ; Killeen, K.P. ; Omstead, T.R.
Author_Institution
Sandia National Laboratories
fYear
1992
fDate
16-19 Nov 1992
Firstpage
11
Lastpage
12
Keywords
Chemical vapor deposition; Inductors; Microelectronics; Monitoring; Optical films; Performance evaluation; Reflectivity; Thickness measurement; Transistors; Vertical cavity surface emitting lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
LEOS '92, Conference Proceedings. IEEE Lasers and Electro-Optics Society, 1992 Annual Meeting
Print_ISBN
0-7803-0526-4
Type
conf
DOI
10.1109/LEOS.1992.693819
Filename
693819
Link To Document