DocumentCode :
19973
Title :
Coulomb blockade in PtSi/porous Si Schottky barrier as a two-dimensional multi-tunnelling junction
Author :
Erfanian, Alireza ; Mehrara, Hamed ; Raissi, Farshid ; Khaje, Mahdi
Author_Institution :
Dept. of Electr. Eng., Malek Ashtar Univ. of Technol., Tehran, Iran
Volume :
9
Issue :
2
fYear :
2015
fDate :
3 2015
Firstpage :
81
Lastpage :
86
Abstract :
The authors report on Coulomb blockade effect in the PtSi/porous Si Schottky barrier. A model of two-dimensional multi-tunnelling junction (2D-MTJ) can explain the blockade characteristic of this barrier. Using the SIMON simulator, the electrical characteristics of the proposed model were investigated. The results show that simulated current-voltage curves achieve a reasonable fit with the measured data and the present model can be used to study the PtSi/porous Si Schottky barrier behaviour. In accordance with both the studies, Coulomb blockade phenomenon is observed in current oscillation and single-electron effect of this device at low temperatures (5 K) is justified using the 2D-MTJ model. In addition, it indicates that by increasing the current value with temperature and for high drain voltages, PtSi/porous Si Schottky barrier behaves like a single island single-electron tunnelling (SET) junction as previously reported by Raissi et al.
Keywords :
Coulomb blockade; Schottky barriers; elemental semiconductors; platinum alloys; porous semiconductors; semiconductor-metal boundaries; silicon; silicon alloys; tunnelling; Coulomb blockade; PtSi-Si; PtSi/porous Si Schottky barrier; SIMON simulator; current oscillation; current-voltage curves; electrical characteristics; single-electron effect; temperature 5 K; two-dimensional multitunnelling junction;
fLanguage :
English
Journal_Title :
Circuits, Devices & Systems, IET
Publisher :
iet
ISSN :
1751-858X
Type :
jour
DOI :
10.1049/iet-cds.2013.0475
Filename :
7081796
Link To Document :
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