• DocumentCode
    19973
  • Title

    Coulomb blockade in PtSi/porous Si Schottky barrier as a two-dimensional multi-tunnelling junction

  • Author

    Erfanian, Alireza ; Mehrara, Hamed ; Raissi, Farshid ; Khaje, Mahdi

  • Author_Institution
    Dept. of Electr. Eng., Malek Ashtar Univ. of Technol., Tehran, Iran
  • Volume
    9
  • Issue
    2
  • fYear
    2015
  • fDate
    3 2015
  • Firstpage
    81
  • Lastpage
    86
  • Abstract
    The authors report on Coulomb blockade effect in the PtSi/porous Si Schottky barrier. A model of two-dimensional multi-tunnelling junction (2D-MTJ) can explain the blockade characteristic of this barrier. Using the SIMON simulator, the electrical characteristics of the proposed model were investigated. The results show that simulated current-voltage curves achieve a reasonable fit with the measured data and the present model can be used to study the PtSi/porous Si Schottky barrier behaviour. In accordance with both the studies, Coulomb blockade phenomenon is observed in current oscillation and single-electron effect of this device at low temperatures (5 K) is justified using the 2D-MTJ model. In addition, it indicates that by increasing the current value with temperature and for high drain voltages, PtSi/porous Si Schottky barrier behaves like a single island single-electron tunnelling (SET) junction as previously reported by Raissi et al.
  • Keywords
    Coulomb blockade; Schottky barriers; elemental semiconductors; platinum alloys; porous semiconductors; semiconductor-metal boundaries; silicon; silicon alloys; tunnelling; Coulomb blockade; PtSi-Si; PtSi/porous Si Schottky barrier; SIMON simulator; current oscillation; current-voltage curves; electrical characteristics; single-electron effect; temperature 5 K; two-dimensional multitunnelling junction;
  • fLanguage
    English
  • Journal_Title
    Circuits, Devices & Systems, IET
  • Publisher
    iet
  • ISSN
    1751-858X
  • Type

    jour

  • DOI
    10.1049/iet-cds.2013.0475
  • Filename
    7081796