DocumentCode
2000441
Title
Novel InP/InGaAs D-HBTs with selective multisteps MOCVD regrowth techniques for high-speed application
Author
Nomura, T. ; Ohkubo, M. ; Sekiguchi, T. ; Ninomiya, T.
Author_Institution
R&D Labs., Furukawa Electr. Co. Ltd., Yokohama, Japan
fYear
1997
fDate
10-10 Dec. 1997
Firstpage
747
Lastpage
750
Abstract
First successful fabrication of HBTs which can reduce the extrinsic base-collector capacitance C/sub ex/ by selective multisteps MOCVD regrowth techniques is demonstrated. We have achieved cutoff frequency f/sub t/ of the regrown-HBTs with a large 6/spl times/18 /spl mu/m/sup 2/ emitter area of 59.6 GHz, which is superior to that of conventional HBTs of 40.2 GHz. The differences of total delay time of the regrown-HBT and conventional HBT was in good agreement with the collector charging time difference estimated from the device geometry, which indicates improvement of the high speed performance was achieved by the reduction of the C/sub ex/.
Keywords
III-V semiconductors; capacitance; gallium arsenide; heterojunction bipolar transistors; indium compounds; millimetre wave bipolar transistors; semiconductor growth; vapour phase epitaxial growth; 40.2 GHz; 59.6 GHz; DHBT; HBT fabrication; InP-InGaAs; InP/InGaAs D-HBTs; extrinsic base-collector capacitance; fabrication; high-speed application; selective multisteps MOCVD regrowth; Capacitance; Cutoff frequency; Delay effects; Delay estimation; Fabrication; Geometry; Heterojunction bipolar transistors; Indium gallium arsenide; Indium phosphide; MOCVD;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1997. IEDM '97. Technical Digest., International
Conference_Location
Washington, DC, USA
ISSN
0163-1918
Print_ISBN
0-7803-4100-7
Type
conf
DOI
10.1109/IEDM.1997.650490
Filename
650490
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