Title :
Microfabricated coupled-cavity backward-wave oscillator for terahertz imaging
Author :
Baik, Chan-Wook ; Son, Young-Mok ; Kim, Sun II ; Jun, Seong Chan ; Kim, Jong-Seok ; Hwang, Junsik ; Kim, Jong-Min ; Moon, Sung-Won ; Kim, Hyoun Jin ; So, Jin-Kyu ; Park Gun-Sik
Author_Institution :
Samsung Adv. Inst. of Technol., Yongin
Abstract :
A design study of a 0.1-THz coupled-cavity backward-wave oscillator (CCBWO) is presented using a finite element method and a particle-in-cell simulation. In experiments, the Si-based technology of 2-step deep reactive ion etching (DRIE) and eutectic bonding shows a good potential for the microfabrication of the interaction circuit. A miniaturized field emission cathode using carbon nanotubes grown by chemical vapor deposition (CVD) is also a good candidate for the electron beam generation. An integration of the cathode and the interaction circuit will be discussed. In addition, a preliminary design of a continuous-wave (CW) THz imaging system is demonstrated for the THz propagation and detection.
Keywords :
backward wave oscillators; bonding processes; carbon nanotubes; cathodes; chemical vapour deposition; electron field emission; finite element analysis; silicon; sputter etching; submillimetre wave imaging; submillimetre wave oscillators; CVD; DRIE; Si; Si-based technology; THz detection; THz propagation; carbon nanotubes; chemical vapor deposition; continuous-wave THz imaging system; coupled-cavity backward-wave oscillator; deep reactive ion etching; electron beam generation; eutectic bonding; field emission cathode; finite element method; frequency 0.1 THz; interaction circuit; particle-in-cell simulation; terahertz imaging; Bonding; Cathodes; Chemical technology; Circuit simulation; Coupling circuits; Etching; Finite element methods; Optical imaging; Oscillators; Submillimeter wave technology; backwardwave oscillator; coupled-cavity; imaging; microfabrication; terahertz;
Conference_Titel :
Vacuum Electronics Conference, 2008. IVEC 2008. IEEE International
Conference_Location :
Monterey, CA
Print_ISBN :
978-1-4244-1715-5
DOI :
10.1109/IVELEC.2008.4556367