DocumentCode
2004554
Title
Beam current instability analysis with FFT
Author
Katsap, Victor ; Kendall, Rodney A. ; Saito, Kenichi
Author_Institution
NuFlare Technol., Hopewell Junction, NY
fYear
2008
fDate
22-24 April 2008
Firstpage
402
Lastpage
403
Abstract
In shaped-beam mask writing tools, beam current is fairly small, often under 1 muA, with required stability of Lt1%. Beam is originated at the cathode, and passes thru multitude of electron-optical components before reaching target plane. Hence, beam current stability is affected by multiple factors, like power supplies, spurious electromagnetic fields, temperature, pressure, and the emitterpsilas own instability. We report results of analysis which allows us to uncover and separate environment-related beam current instabilities from emitter-related ones.
Keywords
cathodes; electron beam lithography; electron guns; fast Fourier transforms; FFT; beam current instability analysis; cathode; electron-optical components; emitter-related instabilities; environment-related instabilities; fast Fourier transform; power supplies; shaped-beam mask writing; spurious electromagnetic fields; Beams; Cathodes; Electronic mail; Fluctuations; Power harmonic filters; Power supplies; Speech analysis; Stability analysis; Temperature; Writing;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Electronics Conference, 2008. IVEC 2008. IEEE International
Conference_Location
Monterey, CA
Print_ISBN
978-1-4244-1715-5
Type
conf
DOI
10.1109/IVELEC.2008.4556369
Filename
4556369
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