• DocumentCode
    2004554
  • Title

    Beam current instability analysis with FFT

  • Author

    Katsap, Victor ; Kendall, Rodney A. ; Saito, Kenichi

  • Author_Institution
    NuFlare Technol., Hopewell Junction, NY
  • fYear
    2008
  • fDate
    22-24 April 2008
  • Firstpage
    402
  • Lastpage
    403
  • Abstract
    In shaped-beam mask writing tools, beam current is fairly small, often under 1 muA, with required stability of Lt1%. Beam is originated at the cathode, and passes thru multitude of electron-optical components before reaching target plane. Hence, beam current stability is affected by multiple factors, like power supplies, spurious electromagnetic fields, temperature, pressure, and the emitterpsilas own instability. We report results of analysis which allows us to uncover and separate environment-related beam current instabilities from emitter-related ones.
  • Keywords
    cathodes; electron beam lithography; electron guns; fast Fourier transforms; FFT; beam current instability analysis; cathode; electron-optical components; emitter-related instabilities; environment-related instabilities; fast Fourier transform; power supplies; shaped-beam mask writing; spurious electromagnetic fields; Beams; Cathodes; Electronic mail; Fluctuations; Power harmonic filters; Power supplies; Speech analysis; Stability analysis; Temperature; Writing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Electronics Conference, 2008. IVEC 2008. IEEE International
  • Conference_Location
    Monterey, CA
  • Print_ISBN
    978-1-4244-1715-5
  • Type

    conf

  • DOI
    10.1109/IVELEC.2008.4556369
  • Filename
    4556369