DocumentCode
2004605
Title
Investigation of secondary electron emission suppression for TWT multistage depressed collectors
Author
Ding, Ming Q. ; Huang, Mingguang ; Feng, Jinjun ; Bai, Guodong ; Yan, Tiechang
Author_Institution
Beijing Vacuum Electron. Res. Inst., Beijing
fYear
2008
fDate
22-24 April 2008
Firstpage
407
Lastpage
408
Abstract
We have built an ion treatment system for TWT multistage depressed collectors (MDCs), and investigated the process for secondary electron emission (SEE) suppression. It is found that SEE ratio for oxygen-free high-conductive copper (OFHC) plates is closely related to deposition rate of Mo and surface texture. With the optimized process, SEE ratio has been reduced to a half of the untreated (OFHC).
Keywords
copper; ion beam assisted deposition; molybdenum; secondary electron emission; surface texture; travelling wave tubes; Cu; Mo; SEE ratio; TWT; ion treatment system; molybdenum deposition rate; multistage depressed collectors; oxygen-free high-conductive copper plates; secondary electron emission suppression; surface texture; Atomic layer deposition; Copper; Electron beams; Electron emission; Ion beams; Pulsed power supplies; Surface texture; Surface treatment; Teeth; Vacuum systems;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Electronics Conference, 2008. IVEC 2008. IEEE International
Conference_Location
Monterey, CA
Print_ISBN
978-1-4244-1715-5
Type
conf
DOI
10.1109/IVELEC.2008.4556372
Filename
4556372
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