DocumentCode :
2005285
Title :
Characterization of osmium-ruthenium coatings for porous tungsten dispenser cathodes
Author :
Balk, T. John ; Li, Wen-Chung ; Roberts, Scott
Author_Institution :
Dept. of Chem. & Mater. Eng., Kentucky Univ., Lexington, KY
fYear :
2008
fDate :
22-24 April 2008
Firstpage :
42
Lastpage :
43
Abstract :
Dispenser cathodes serve as electron sources in numerous vacuum devices, including traveling wave tubes and cathode ray tubes. These devices find use in commercial, military and space applications, requiring a long and reliable operating lifetime, especially for space-based operation. Semicon Associates, in Lexington, KY, leads this market, producing over 20,000 dispenser cathodes annually. The cathodes comprise several materials, including platinum group metal coatings that add significant production cost. It is not yet understood how the microstructure of these precious metal films affects cathode performance. Fundamental understanding of microstructure-property relationships in the coating could improve device performance and allow more economical use of the precious metals.
Keywords :
cathodes; coatings; crystal microstructure; osmium alloys; porous materials; ruthenium alloys; tungsten; OsRu; W; device performance; electron sources; metal films affects cathode performance; microstructure property relationships; osmium ruthenium coatings; platinum group metal coatings; porous tungsten dispenser cathodes; Cathode ray tubes; Coatings; Costs; Electron sources; Electron tubes; Inorganic materials; Platinum; Production; Space exploration; Tungsten; microstructure; osmium ruthenium; thin film;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Electronics Conference, 2008. IVEC 2008. IEEE International
Conference_Location :
Monterey, CA
Print_ISBN :
978-1-4244-1715-5
Type :
conf
DOI :
10.1109/IVELEC.2008.4556406
Filename :
4556406
Link To Document :
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