Title :
A higher dimensional theory of electrical contact resistance
Author :
Tang, Wilkin ; Lau, Y.Y.
Author_Institution :
Dept. of Nucl. Eng. & Radiol. Sci., Univ. of Michigan, Ann Arbor, MI
Abstract :
The electrical contact resistance is computed for a local constriction of finite length and finite transverse dimension in a conducting current channel. Conformal mapping is used for the case of a rectangular channel. An analytic scaling law is constructed for the contact resistance over a wide range of aspect ratios between the constriction and the main current channel. The classical theory of Holm and Timsit is generalized to include finite length effects of the ldquoa-spotrdquo, defined as a small circular area of zero thickness through which current can flow. Potential applications and extensions of the theory are indicated.
Keywords :
conformal mapping; contact resistance; Holm-Timsit theory; analytic scaling law; conformal mapping; electrical contact resistance; finite length dimension; finite transverse dimension; higher dimensional theory; wafer evaluation; Bridges; Cathodes; Contact resistance; Electric resistance; Electromagnetic heating; Rough surfaces; Surface contamination; Surface resistance; Surface roughness; Wire; contacts; resistance; wafer evaluation;
Conference_Titel :
Vacuum Electronics Conference, 2008. IVEC 2008. IEEE International
Conference_Location :
Monterey, CA
Print_ISBN :
978-1-4244-1715-5
DOI :
10.1109/IVELEC.2008.4556501