Title :
Field enhancement on knife-edge cathodes
Author :
Miller, Ryan ; Lau, Yue Yin ; Booske, John
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Wisconsin, Madison, WI
Abstract :
We extend the analysis of single rectangular-ridge field enhancement to the case of a double ridge.
Keywords :
cathodes; electron field emission; cold cathodes; double ridge; field emission; knife-edge cathodes; single rectangular-ridge field enhancement; Cathodes; Copper; Electron emission; Laboratories; Lithography; Nuclear and plasma sciences; Power engineering and energy; Robustness; Surface treatment; Voltage; cold cathodes; field emission; field enhancement;
Conference_Titel :
Vacuum Electronics Conference, 2008. IVEC 2008. IEEE International
Conference_Location :
Monterey, CA
Print_ISBN :
978-1-4244-1715-5
DOI :
10.1109/IVELEC.2008.4556528
