DocumentCode
2007776
Title
Novel electrode configurations in dual-layer stacked and switchable ALN contour-mode resonators for low impedance filter termination and reduced insertion loss
Author
Zuo, Chengjie ; Sinha, Nipun ; Piazza, Gianluca
Author_Institution
Penn Micro & Nano Syst. (PMaNS) Lab., Univ. of Pennsylvania, Philadelphia, PA, USA
fYear
2010
fDate
24-28 Jan. 2010
Firstpage
719
Lastpage
722
Abstract
This paper reports, for the first time, on the design and demonstration of two novel electrode configurations in dual-layer stacked Aluminum Nitride (AlN) piezoelectric contour-mode resonators to obtain low filter termination resistance (down to 300 ¿, which also results in better filter out-of-band rejection) and reduced insertion loss (IL as low as 1.6 dB) in multi-frequency (100 MHz - 1 GHz) AlN MEMS filters. The microfabrication process is fully compatible with the previously demonstrated AlN RF MEMS switches, which makes it possible to design and integrate multi-frequency switchable filter banks on a single chip.
Keywords
III-V semiconductors; micromechanical devices; AlN piezoelectric contour-mode resonators; dual-layer stacked AlN contour-mode resonators; dual-layer stacked aluminum nitride; electrode configuration; low filter termination resistance; low impedance filter termination; microfabrication process; multifrequency AlN MEMS filters; multifrequency switchable filter banks; reduced insertion loss; switchable AlN contour-mode resonators; Aluminum nitride; Bandwidth; Channel bank filters; Electrodes; Filter bank; Impedance; Insertion loss; Micromechanical devices; Radio frequency; Resonator filters;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems (MEMS), 2010 IEEE 23rd International Conference on
Conference_Location
Wanchai, Hong Kong
ISSN
1084-6999
Print_ISBN
978-1-4244-5761-8
Electronic_ISBN
1084-6999
Type
conf
DOI
10.1109/MEMSYS.2010.5442305
Filename
5442305
Link To Document