Microelectromagnetic matrix for local assembling of magnetic nanoparticles

Author

Luby, S. ; Chitu, L. ; Majkova, E. ; Senderak, R. ; Kostic, J. ; Hrkut, P. ; Matay, L. ; Hascik, S. ; Lalinsky, T. ; Capek, I. ; Satka, A.

Author_Institution

Inst. of Phys., Slovak Acad. Sci., Bratislava

fYear

2006

fDate

Oct. 2006

Firstpage

7

Lastpage

10

Abstract

Microelectromagnetic matrix fabricated by lithography patterning on Si chip for the manipulation and assembling of nanoparticles (NP) by local magnetic field created by current loaded thin film conductors is described. Co, Fe₃O₄ and CoFe₂O₄ NPs are manipulated by matrix elements - meanders, grids and ring traps loaded at the electromigration limit of Ag conductors. The design of matrix is based on calculations of magnetic field over the elements covered by polyimide layer. Amorphous silicon is used as a manipulation surface

Keywords

assembling; cobalt compounds; electromigration; elemental semiconductors; iron compounds; magnetic particles; nanolithography; nanoparticles; nanopatterning; silicon; silver; Ag; CoFe₂O₄; Fe₃O₄; Si; amorphous silicon; assembling; electromigration limit; lithography patterning; local magnetic field; magnetic nanoparticles; microelectromagnetic matrix; polyimide layer; silicon chip; silver conductors; thin film conductors; Amorphous magnetic materials; Assembly; Conductive films; Electromigration; Iron; Lithography; Magnetic fields; Magnetic films; Nanoparticles; Semiconductor thin films;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Semiconductor Devices and Microsystems, 2006. ASDAM '06. International Conference on

Conference_Location

Smolenice Castle

Print_ISBN

1-4244-0369-0

Type

conf

DOI

10.1109/ASDAM.2006.331141

Filename

4133065