Title :
Influence of Under-Metal Planes on Al
Author :
Shibata, H. ; Ikeda, N. ; Murota, M. ; Asahi, Y. ; Hashimoto, K.
Author_Institution :
TOSHIBA Microelectronics Corporation, Japan
Keywords :
Annealing; Argon; Conductors; Crystallography; Grain boundaries; Optical films; Stress; Surface treatment; Tin; X-ray diffraction;
Conference_Titel :
VLSI Technology, 1991. Digest of Technical Papers., 1991 Symposium on
Conference_Location :
Oiso, Japan
DOI :
10.1109/VLSIT.1991.705976
