DocumentCode :
2009010
Title :
Analysis of device geometry on the ruggedness of power DMOS transistor supported by 3-D modeling and simulation
Author :
Vrbicky, Andrej ; Donoval, Daniel ; Marek, Juraj ; Chvala, Ales ; Beno, Peter
Author_Institution :
Dept. of Microelectron., Slovak Univ. of Technol., Bratislava
fYear :
2006
fDate :
Oct. 2006
Firstpage :
259
Lastpage :
262
Abstract :
The influence of geometrical dimensions on the properties of power DMOSFET´s has been studied by 3-D numerical modeling and simulation. The results of 3-D simulation provide a very effective way for the identification of failure mechanism and location of device hot-spots. The analysis of the influence of the geometry of one device cell including the position of ohmic contact to a p-type well on the turn-on of the parasitic bipolar transistor and corresponding device ruggedness is straightforward
Keywords :
ohmic contacts; power MOSFET; power bipolar transistors; semiconductor device models; 3D modeling; 3D simulation; device geometry; device hot-spots; failure mechanism; ohmic contact; parasitic bipolar transistor; power DMOS transistor; Analytical models; Bipolar transistors; Doping profiles; Geometry; Numerical simulation; Ohmic contacts; Semiconductor process modeling; Solid modeling; Testing; Three dimensional displays;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Devices and Microsystems, 2006. ASDAM '06. International Conference on
Conference_Location :
Smolenice Castle
Print_ISBN :
1-4244-0369-0
Type :
conf
DOI :
10.1109/ASDAM.2006.331203
Filename :
4133127
Link To Document :
بازگشت