Title :
High Rate Deposition Copper Cvd
Author :
Awaya, Nobuyoshi ; Arita, Yoshinobu
Author_Institution :
NTT LSI Laboratories, Japan
Keywords :
Conductivity; Copper; Electric resistance; Hydrogen; Large scale integration; Optical films; Reflectivity; Substrates; Surface morphology; Temperature;
Conference_Titel :
VLSI Technology, 1991. Digest of Technical Papers., 1991 Symposium on
Conference_Location :
Oiso, Japan
DOI :
10.1109/VLSIT.1991.705978
