DocumentCode

2009059

Title

High Rate Deposition Copper Cvd

Author

Awaya, Nobuyoshi ; Arita, Yoshinobu

Author_Institution

NTT LSI Laboratories, Japan

fYear

1991

fDate

28-30 May 1991

Firstpage

37

Lastpage

38

Keywords

Conductivity; Copper; Electric resistance; Hydrogen; Large scale integration; Optical films; Reflectivity; Substrates; Surface morphology; Temperature;

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1991. Digest of Technical Papers., 1991 Symposium on

Conference_Location

Oiso, Japan

Type

conf

DOI

10.1109/VLSIT.1991.705978

Filename

705978