DocumentCode
2009332
Title
Epitaxial bismuth telluride layers grown on [111] barium fluoride substrates suitable for MQW-growth
Author
Nurnus, Joachim ; Böttner, H. ; Beyer, H. ; Lambrecht, A.
Author_Institution
Fraunhofer Inst. Phys. Messtech., Freiburg, Germany
fYear
1999
fDate
Aug. 29 1999-Sept. 2 1999
Firstpage
696
Lastpage
699
Abstract
Multi quantum wells and superlattices are discussed as suitable tools for increasing ZT. Best layer quality should be expected only for lattice matched growth. Therefore [111] barium fluoride should be most suitable compared to other common substrates like mica and sapphire, although up to now epitaxial growth of bismuth telluride on [111] barium fluoride with atomically flatness was not achieved. We present the first bismuth telluride-layers reproducibly prepared on [111] barium fluoride substrates using the molecular beam technique. Three essential factors influence the growth of bismuth telluride on barium fluoride: substrate temperature, the flux ratio of Bi/Te and substrate surface preparation itself even for single crystal [111] barium fluoride substrates. These dependencies of growth characteristics and layer properties are reported. AFM and RHEED analysis show suitable layer by layer growth of bismuth telluride with step height of 1 nm as expected from its crystal structure. Step widths of growth terraces are similar to those known from other MQW-suitable systems like IV-VI-compounds. Further X-ray analysis combined with EDX-analysis (single crystals standard) indicates single phase growth with stable stochiometric composition.
Keywords
X-ray chemical analysis; atomic force microscopy; bismuth compounds; molecular beam epitaxial growth; reflection high energy electron diffraction; semiconductor epitaxial layers; semiconductor growth; semiconductor materials; semiconductor quantum wells; semiconductor superlattices; thermoelectricity; AFM; BaF/sub 2/; BaF/sub 2/[111] substrates; Bi/sub 2/Te/sub 3/; EDX-analysis; RHEED; epitaxial layers; flux ratio; growth terraces; layer by layer growth; layer quality; molecular beam epitaxy; multi quantum wells; single phase growth; stochiometric composition; substrate surface preparation; substrate temperature; superlattices; Atomic layer deposition; Barium; Bismuth; Epitaxial growth; Lattices; Molecular beam epitaxial growth; Substrates; Superlattices; Tellurium; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Thermoelectrics, 1999. Eighteenth International Conference on
Conference_Location
Baltimore, MD, USA
ISSN
1094-2734
Print_ISBN
0-7803-5451-6
Type
conf
DOI
10.1109/ICT.1999.843481
Filename
843481
Link To Document