• DocumentCode
    2009332
  • Title

    Epitaxial bismuth telluride layers grown on [111] barium fluoride substrates suitable for MQW-growth

  • Author

    Nurnus, Joachim ; Böttner, H. ; Beyer, H. ; Lambrecht, A.

  • Author_Institution
    Fraunhofer Inst. Phys. Messtech., Freiburg, Germany
  • fYear
    1999
  • fDate
    Aug. 29 1999-Sept. 2 1999
  • Firstpage
    696
  • Lastpage
    699
  • Abstract
    Multi quantum wells and superlattices are discussed as suitable tools for increasing ZT. Best layer quality should be expected only for lattice matched growth. Therefore [111] barium fluoride should be most suitable compared to other common substrates like mica and sapphire, although up to now epitaxial growth of bismuth telluride on [111] barium fluoride with atomically flatness was not achieved. We present the first bismuth telluride-layers reproducibly prepared on [111] barium fluoride substrates using the molecular beam technique. Three essential factors influence the growth of bismuth telluride on barium fluoride: substrate temperature, the flux ratio of Bi/Te and substrate surface preparation itself even for single crystal [111] barium fluoride substrates. These dependencies of growth characteristics and layer properties are reported. AFM and RHEED analysis show suitable layer by layer growth of bismuth telluride with step height of 1 nm as expected from its crystal structure. Step widths of growth terraces are similar to those known from other MQW-suitable systems like IV-VI-compounds. Further X-ray analysis combined with EDX-analysis (single crystals standard) indicates single phase growth with stable stochiometric composition.
  • Keywords
    X-ray chemical analysis; atomic force microscopy; bismuth compounds; molecular beam epitaxial growth; reflection high energy electron diffraction; semiconductor epitaxial layers; semiconductor growth; semiconductor materials; semiconductor quantum wells; semiconductor superlattices; thermoelectricity; AFM; BaF/sub 2/; BaF/sub 2/[111] substrates; Bi/sub 2/Te/sub 3/; EDX-analysis; RHEED; epitaxial layers; flux ratio; growth terraces; layer by layer growth; layer quality; molecular beam epitaxy; multi quantum wells; single phase growth; stochiometric composition; substrate surface preparation; substrate temperature; superlattices; Atomic layer deposition; Barium; Bismuth; Epitaxial growth; Lattices; Molecular beam epitaxial growth; Substrates; Superlattices; Tellurium; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Thermoelectrics, 1999. Eighteenth International Conference on
  • Conference_Location
    Baltimore, MD, USA
  • ISSN
    1094-2734
  • Print_ISBN
    0-7803-5451-6
  • Type

    conf

  • DOI
    10.1109/ICT.1999.843481
  • Filename
    843481