Title :
Improved Performance and Reliability of MOSFETs with Ultrathin Gate Oxides Prepared by Conventional Furnace Oxidation of Si in Pure N/sub 2/O Ambient
Author :
Lo, G.Q. ; Ting, W. ; Ahn, J. ; Kwong, D.L.
Author_Institution :
The University of Texas at Austin
Keywords :
CMOS technology; Degradation; Furnaces; Isolation technology; MOS capacitors; MOSFETs; Microelectronics; Oxidation; Thermal resistance; Thermal stresses;
Conference_Titel :
VLSI Technology, 1991. Digest of Technical Papers., 1991 Symposium on
Conference_Location :
Oiso, Japan
DOI :
10.1109/VLSIT.1991.705981
