DocumentCode
2010003
Title
Charge transfer in plasma processing
Author
Shin, Eun-Hee ; Murray, Paul T.
Author_Institution
Res. Inst. & Electro-Opt. Program, Dayton Univ., OH, USA
fYear
2003
fDate
5-5 June 2003
Firstpage
123
Abstract
Summary form only given, as follows. Plasma processing is widely used to alter the properties of materials as well as to synthesize new materials. One such process is plasma polymerization. The elementary processes that occur during plasma polymerization of acetylene have been investigated and are reported here. Specifically, orthogonal-acceleration time-of-flight mass spectrometry as well as optical emission spectroscopy have been employed to detect ions and excited species, present in C/sub 2/H/sub 2//Ar and O/sub 2/ plasmas. Mass spectra, optical emission spectra, and ion kinetic energy distributions were obtained, and they showed a decrease in energetic (/spl sim/400eV) ion signal with increasing pressure and a change in the ion kinetic energy distributions. The results suggest that there are symmetric charge transfer processes within the plasma sheath. High energy neutral particles generated from such processes my have considerable influence in determining the properties of films grown by the plasma polymerization process.
Keywords
atomic emission spectroscopy; charge exchange; plasma chemistry; plasma diagnostics; plasma materials processing; polymerisation; time of flight mass spectra; acetylene; excited species; high energy neutral particles; ion kinetic energy distributions; optical emission spectroscopy; orthogonal-acceleration TOF mass spectra; plasma materials processing; plasma polymerization; plasma sheath; symmetric charge transfer processes; Charge transfer; Mass spectroscopy; Optical films; Optical materials; Particle beam optics; Plasma materials processing; Plasma properties; Plasma sheaths; Polymers; Stimulated emission;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location
Jeju, South Korea
ISSN
0730-9244
Print_ISBN
0-7803-7911-X
Type
conf
DOI
10.1109/PLASMA.2003.1228536
Filename
1228536
Link To Document