• DocumentCode
    2010954
  • Title

    12° design rule for single crystal silicon curved beam compliant mechanisms with large deformation

  • Author

    Chen, Tzung-Ming ; Krausse, Stefan ; Korvink, Jan G. ; Wallrabe, Ulrike

  • Author_Institution
    IMTEK, Univ. of Freiburg, Freiburg, Germany
  • fYear
    2010
  • fDate
    24-28 Jan. 2010
  • Firstpage
    552
  • Lastpage
    555
  • Abstract
    We present a new 12° design rule to enhance the reliability of single crystal silicon (SCS) compliant mechanism with large deformation. This rule defines a suitable structure orientation on an SCS wafer and avoids failure of stress induced crystal slip on curved compliant beams. Our rule considers the crystalline directional properties, such as Young´s Modulus and fracture strength, of SCS. We fabricated a rotational mirror as demonstrator which was displaced by a piezoelectric actuator. Obeying to the 12° design rule we achieved a 100% larger rotational angle at the mirror section than in case of arbitrary orientation.
  • Keywords
    Young´s modulus; deformation; elemental semiconductors; fracture toughness; mirrors; optical design techniques; optical fabrication; optical materials; silicon; slip; 12° design rule; Si; Young´s Modulus; crystalline directional properties; fracture strength; large deformation; optical fabrication; rotational angle; rotational mirror; single crystal silicon curved beam compliant mechanisms; stress induced crystal slip; structure orientation; Anisotropic magnetoresistance; Crystalline materials; Crystallization; Kinematics; Maintenance; Manufacturing; Micromechanical devices; Mirrors; Silicon; Stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems (MEMS), 2010 IEEE 23rd International Conference on
  • Conference_Location
    Wanchai, Hong Kong
  • ISSN
    1084-6999
  • Print_ISBN
    978-1-4244-5761-8
  • Electronic_ISBN
    1084-6999
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2010.5442442
  • Filename
    5442442