DocumentCode
2010954
Title
12° design rule for single crystal silicon curved beam compliant mechanisms with large deformation
Author
Chen, Tzung-Ming ; Krausse, Stefan ; Korvink, Jan G. ; Wallrabe, Ulrike
Author_Institution
IMTEK, Univ. of Freiburg, Freiburg, Germany
fYear
2010
fDate
24-28 Jan. 2010
Firstpage
552
Lastpage
555
Abstract
We present a new 12° design rule to enhance the reliability of single crystal silicon (SCS) compliant mechanism with large deformation. This rule defines a suitable structure orientation on an SCS wafer and avoids failure of stress induced crystal slip on curved compliant beams. Our rule considers the crystalline directional properties, such as Young´s Modulus and fracture strength, of SCS. We fabricated a rotational mirror as demonstrator which was displaced by a piezoelectric actuator. Obeying to the 12° design rule we achieved a 100% larger rotational angle at the mirror section than in case of arbitrary orientation.
Keywords
Young´s modulus; deformation; elemental semiconductors; fracture toughness; mirrors; optical design techniques; optical fabrication; optical materials; silicon; slip; 12° design rule; Si; Young´s Modulus; crystalline directional properties; fracture strength; large deformation; optical fabrication; rotational angle; rotational mirror; single crystal silicon curved beam compliant mechanisms; stress induced crystal slip; structure orientation; Anisotropic magnetoresistance; Crystalline materials; Crystallization; Kinematics; Maintenance; Manufacturing; Micromechanical devices; Mirrors; Silicon; Stress;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems (MEMS), 2010 IEEE 23rd International Conference on
Conference_Location
Wanchai, Hong Kong
ISSN
1084-6999
Print_ISBN
978-1-4244-5761-8
Electronic_ISBN
1084-6999
Type
conf
DOI
10.1109/MEMSYS.2010.5442442
Filename
5442442
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