DocumentCode
2011133
Title
Measurement of electron energy distribution in an asymmetric capacitively coupled plasmas
Author
Kwak, G.Y. ; Ahn, J.S. ; Lee, Byoung-Kuk ; Choi, Young-Sik ; Chung, Ki-Seok
Author_Institution
Dept. of Nucl. Engineenng, Hanyang Univ., Seoul, South Korea
fYear
2003
fDate
5-5 June 2003
Firstpage
152
Abstract
Summary form only given, as follows. In a low-pressure capacitive coupled Argon RF Discharge at 13.56 MHz, the electron energy distribution function (EEDF) was measured with RF compensated probe. Measurements have been made in Argon ranging in gas pressure from 1 mTorr to 50 mTorr and in a power of 1.2 kW. Measurements also show the differences between RF compensated probe and uncompensated probe. With increasing gas pressure a transition from low temperature mode to high temperature mode was found.
Keywords
argon; high-frequency discharges; plasma density; plasma probes; 1 to 50 mtorr; 1.2 kW; 13.56 MHz; Ar; RF compensated probe; asymmetric capacitively coupled plasmas; electron energy distribution function; low-pressure RF discharge; temperature mode transition; Argon; Distribution functions; Electrons; Energy measurement; Plasma measurements; Plasma temperature; Power measurement; Pressure measurement; Probes; Radio frequency;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location
Jeju, South Korea
ISSN
0730-9244
Print_ISBN
0-7803-7911-X
Type
conf
DOI
10.1109/PLASMA.2003.1228589
Filename
1228589
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