MEMS-based exposure module for continuous lithography process on fiber substrates

This paper presents novel exposure module-based patterning technique for realizing continuous lithography process on fiber substrates. Fine patterns (better than 10 ¿m L/S) were successfully formed on the fiber with the diameter of 125 ¿m by using the exposure module. The exposure module exhibited advantages of low cost, easy alignment, high productivity and excellent compatibility with other microfabrication processes. It is an attractive patterning solution to the integration of functional devices and structures onto the fiber substrates.