Title :
Perspectives On MOS Directions
Author_Institution :
Maruman Integrated Circuits, Inc,
Keywords :
Costs; Doping; Dry etching; Integrated circuit technology; Large scale integration; Logic circuits; MOS devices; Plasma temperature; Virtual manufacturing; Voltage;
Conference_Titel :
COMPCON Fall '77
DOI :
10.1109/CMPCON.1977.680835
