DocumentCode
2011944
Title
Heterogeneous integration of vaporliquidsolid grown silicon microprobe arrays/(111) and MOSFETs/(100) using a silicon on insulator substrate
Author
Okugawa, Akihiro ; Mayumi, Kotaro ; Kawano, Takeshi ; Ishida, Makoto
Author_Institution
Toyohashi Univ. of Technol., Toyohashi, Japan
fYear
2010
fDate
24-28 Jan. 2010
Firstpage
372
Lastpage
375
Abstract
Herein we report heterogeneous integration of vertically-aligned silicon (Si) microprobe arrays/(111) with MOSFET circuits/(100) by IC processes and subsequent selective vapor-liquid-solid (VLS) growth of silicon. A hybrid silicon-on-insulator (SOI) substrate with a (100) topSi/buried oxide (BOX)/(111) handle-Si system was utilized for the integration technique. MOSFETs were fabricated on (100) topSi, and VLS-Si probe arrays were assembled at the exposed (111) handle-Si wafer where the (100) top-Si region was removed by anisotropic etching. The different Si layers of the MOSFETs and probes were electrically connected by a 3D metallization technique. Additionally, we investigated the electrical properties of 3D metallization and the MOSFETs. The results indicate potential for heterogeneous integration of VLS probes/(111) and MOSFETs/(100). The proposed technique also promises further integrations of numerous microdevices/different species of substrates and microelectronics/(100) on the same chip.
Keywords
MOSFET circuits; etching; microassembling; semiconductor device metallisation; semiconductor growth; silicon; silicon-on-insulator; 3D metallization; IC process; MOSFET circuit; Si; VLS probes; anisotropic etching; assembly; buried oxide; electrical property; handle-Si wafer; heterogeneous integration; silicon on insulator substrate; top-Si region; vapor-liquid-solid grown silicon microprobe arrays; Chemical sensors; Electron traps; Etching; MOSFETs; Metallization; Microelectronics; Nanoelectromechanical systems; Probes; Silicon on insulator technology; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems (MEMS), 2010 IEEE 23rd International Conference on
Conference_Location
Wanchai, Hong Kong
ISSN
1084-6999
Print_ISBN
978-1-4244-5761-8
Electronic_ISBN
1084-6999
Type
conf
DOI
10.1109/MEMSYS.2010.5442489
Filename
5442489
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