• DocumentCode
    2012102
  • Title

    Batch fabrication of scanning microscopy probes for thermal and magnetic imaging using standard micromachining

  • Author

    Sarajlic, E. ; Vermeer, R. ; Delalande, M.Y. ; Siekman, M.H. ; Huijink, R. ; Fujita, H. ; Abelmann, L.

  • Author_Institution
    SmartTip B.V., Netherlands
  • fYear
    2010
  • fDate
    24-28 Jan. 2010
  • Firstpage
    328
  • Lastpage
    331
  • Abstract
    We present a process for batch fabrication of a novel scanning microscopy probe for thermal and magnetic imaging using standard micromachining and conventional optical contact lithography. The probe features an AFM-type cantilever with a sharp pyramidal tip composed of four freestanding silicon nitride nanowires coated by conductive material. The nanowires form an electrical cross junction at the apex of the tip, addressable through the electrodes integrated on the cantilever. The cross junction on the tip apex can be utilized to produce heat and detect local temperature changes or to serve as a miniaturized Hall magnetometer enabling, in principle, thermal and magnetic imaging by scanning the probe tip over a surface. We have successfully fabricated a first probe prototype with a nanowire tip composed of 140 nm thick and 11 ¿m long silicon nitride wires metallized by 6 nm titan and 30 nm gold layers. We have experimentally characterized electrical and thermal properties of the probe demonstrating its proper functioning.
  • Keywords
    atomic force microscopy; infrared imaging; magnetometers; microfabrication; micromachining; nanowires; scanning probe microscopy; AFM-type cantilever; batch fabrication; conductive material; electrical cross junction; magnetic imaging; nanowires; optical contact lithography; scanning microscopy probes; silicon nitride nanowires; size 11 mum; size 140 nm; size 30 nm; standard micromachining; thermal imaging; thermal-magnetic imaging; Atomic force microscopy; Contacts; Magnetic force microscopy; Micromachining; Nanowires; Optical device fabrication; Optical imaging; Optical microscopy; Probes; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems (MEMS), 2010 IEEE 23rd International Conference on
  • Conference_Location
    Wanchai, Hong Kong
  • ISSN
    1084-6999
  • Print_ISBN
    978-1-4244-5761-8
  • Electronic_ISBN
    1084-6999
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2010.5442498
  • Filename
    5442498