• DocumentCode
    2012695
  • Title

    High temperature oxidation resistance of TiAl alloys by plasma based ion implantation

  • Author

    Ishii, T. ; Murakami, K. ; Fujita, K. ; Hibino, Y.

  • Author_Institution
    Ion Eng. Res. Inst. Corp., Osaka, Japan
  • fYear
    2003
  • fDate
    5-5 June 2003
  • Firstpage
    194
  • Abstract
    Summary form only given, as follows. A plasma based ion implantation (PBII) system has been studied to achieved a uniform ion implantation to a three-dimensional workpiece. The gas plasma has been used to improve anti-corrosion and tribological properties. In order to expand the application area of PBII, a metal plasma source has been investigated for the surface modification in several materials. Ion implantation has been utilized as an effective method for improving the oxidation behavior of TiAl alloys However, metal plasma-based ion implantation (Me-PBII) has some problems such as film deposition during ion implantation. Recently, we have developed the Me-PBII system with a pulse arc source to reduce the film deposition. In this study, the improvement of the oxidation resistance of TiAl alloy is reported by Me-PBII.
  • Keywords
    aluminium alloys; ion implantation; oxidation; plasma materials processing; titanium alloys; TiAl; high temperature oxidation resistance; metal plasma-based ion implantation; plasma based ion implantation; Ion implantation; Niobium; Oxidation; Plasma applications; Plasma immersion ion implantation; Plasma materials processing; Plasma sources; Plasma temperature; Surface resistance; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
  • Conference_Location
    Jeju, South Korea
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-7911-X
  • Type

    conf

  • DOI
    10.1109/PLASMA.2003.1228666
  • Filename
    1228666