DocumentCode
2012695
Title
High temperature oxidation resistance of TiAl alloys by plasma based ion implantation
Author
Ishii, T. ; Murakami, K. ; Fujita, K. ; Hibino, Y.
Author_Institution
Ion Eng. Res. Inst. Corp., Osaka, Japan
fYear
2003
fDate
5-5 June 2003
Firstpage
194
Abstract
Summary form only given, as follows. A plasma based ion implantation (PBII) system has been studied to achieved a uniform ion implantation to a three-dimensional workpiece. The gas plasma has been used to improve anti-corrosion and tribological properties. In order to expand the application area of PBII, a metal plasma source has been investigated for the surface modification in several materials. Ion implantation has been utilized as an effective method for improving the oxidation behavior of TiAl alloys However, metal plasma-based ion implantation (Me-PBII) has some problems such as film deposition during ion implantation. Recently, we have developed the Me-PBII system with a pulse arc source to reduce the film deposition. In this study, the improvement of the oxidation resistance of TiAl alloy is reported by Me-PBII.
Keywords
aluminium alloys; ion implantation; oxidation; plasma materials processing; titanium alloys; TiAl; high temperature oxidation resistance; metal plasma-based ion implantation; plasma based ion implantation; Ion implantation; Niobium; Oxidation; Plasma applications; Plasma immersion ion implantation; Plasma materials processing; Plasma sources; Plasma temperature; Surface resistance; Surface treatment;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location
Jeju, South Korea
ISSN
0730-9244
Print_ISBN
0-7803-7911-X
Type
conf
DOI
10.1109/PLASMA.2003.1228666
Filename
1228666
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