Title :
Mechanically flexible double gate a-IGZO TFTs
Author :
Münzenrieder, Niko ; Zysset, Christoph ; Kinkeldei, Thomas ; Petti, Luisa ; Salvatore, Giovanni A. ; Tröster, Gerhard
Author_Institution :
Inst. for Electron., Swiss Fed. Inst. of Technol. Zurich, Zurich, Switzerland
Abstract :
In this paper, the concept of double gate transistors is applied to mechanically flexible amorphous Indium-Gallium-Zinc-Oxide (a-IGZO) thin film transistors (TFTs) fabricated on free standing plastic foils. Due to the temperature sensitivity of the plastic substrate, a-IGZO is a suitable semiconductor since it provides carrier mobilities of ~ 10 cm2/Vs when deposited at room temperature. Double gate TFTs with connected bottom and top gate are compared to bottom gate reference TFTs fabricated on the same substrate. Double gate a-IGZO TFTs exhibit a by 74% increased gate capacitance, a by 0,7 V higher threshold voltage, and therefore an up to 51% increased transconductance. The subthreshold swing and the on/off current ratios are improved as well, and reach excellent values of 69 mV/dec and 2×109, respectively. The mechanical flexibility is demonstrated by showing device operation while the TFT is exposed to tensile strain of 0.55%, induced by bending to a radius of 5 mm.
Keywords :
amorphous semiconductors; gallium compounds; indium compounds; thin film transistors; zinc compounds; carrier mobility; double gate TFT; double gate transistor; flexible amorphous indium-gallium-zinc-oxide; flexible double gate a-IGZO TFT; free standing plastic foils; gate capacitance; mechanical flexibility; plastic substrate; size 5 mm; temperature sensitivity; tensile strain; thin film transistor; transconductance; Aluminum oxide; Capacitance; Logic gates; Substrates; Thin film transistors; Threshold voltage;
Conference_Titel :
Solid-State Device Research Conference (ESSDERC), 2012 Proceedings of the European
Conference_Location :
Bordeaux
Print_ISBN :
978-1-4673-1707-8
Electronic_ISBN :
1930-8876
DOI :
10.1109/ESSDERC.2012.6343351