Title :
From FinFET to nanowire ISFET
Author :
Zaborowski, Michal ; Tomaszewski, Daniel ; Dumania, Piotr ; Grabiec, Piotr
Author_Institution :
Div. of Silicon Microsyst. & Nanostruct. Technol., Inst. of Electron Technol. ITE, Warsaw, Poland
Abstract :
A p-type FinFET manufacturing process has been presented. It is a starting point for development of H+ ion-sensitive n-type nanowire FETs (ISFETs). In the paper, new process steps are pointed out together with SEM examination. Characteristics of the n-type junctionless FETs have been measured in buffer solutions in a beaker and in contact with a single drop of the liquid. ISFET current versus pH and voltage versus pH curves have been presented and discussed. Relatively small hysteresis and drifts in pH measurements have been found.
Keywords :
MOSFET; nanowires; SEM examination; ion sensitive n type nanowire FET; n type junctionless FET; nanowire ISFET; p type FinFET manufacturing process; Electrodes; FinFETs; Lithography; Logic gates; Sensor phenomena and characterization; Silicon;
Conference_Titel :
Solid-State Device Research Conference (ESSDERC), 2012 Proceedings of the European
Conference_Location :
Bordeaux
Print_ISBN :
978-1-4673-1707-8
Electronic_ISBN :
1930-8876
DOI :
10.1109/ESSDERC.2012.6343359