DocumentCode :
2013758
Title :
Investigation of the Magnesium Silicide -- Mg2Si Films
Author :
Kamilov, T.S. ; Kabilov, D.K. ; Kamilova, R.Kh. ; Azimov, M.E. ; Klechkovskaya, V.V. ; Orekhov, A.S. ; Suvorova, E.I.
Author_Institution :
Tashkent State Aviation Inst.
fYear :
2006
fDate :
6-10 Aug. 2006
Firstpage :
468
Lastpage :
469
Abstract :
The silicides are ecologically friendly materials and they have a mechanical stability to corrosion, oxidation, decay and aggressive environments. It is known that a bulk magnesium silicide - Mg2Si demonstrates semiconductor conductivity n-type character with energy band gap Eg=0.78 eV and solid solution based on the Mg2Si-Mg2Sn have figure of merit of ZT>1 [Samsonov, et. al. 1979]. Only small part of articles has devoted to thin Mg2Si films on silicon. In this work the magnesium silicide films have been grown on silicon substrate by reactive diffusion method and their thermoelectric properties were investigated
Keywords :
diffusion; electrical conductivity; energy gap; magnesium compounds; semiconductor thin films; thermoelectricity; Mg2Si; Si; corrosion resistance; decay resistance; energy band gap; magnesium silicide films; merit figure; oxidation resistance; reactive diffusion method; semiconductor thin films; solid solutions; thermoelectricity; Conducting materials; Conductivity; Corrosion; Magnesium compounds; Oxidation; Semiconductor films; Semiconductor materials; Silicides; Silicon; Stability;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Thermoelectrics, 2006. ICT '06. 25th International Conference on
Conference_Location :
Vienna
ISSN :
1094-2734
Print_ISBN :
1-4244-0810-5
Electronic_ISBN :
1094-2734
Type :
conf
DOI :
10.1109/ICT.2006.331316
Filename :
4133331
Link To Document :
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