Title :
Large area ICP assisted inline magnetron sputtering system development for flat panel displays
Abstract :
Summary form only given, as follows. Flat panel display (LCD, PDP, OLED) requires high quality thin film layer (ITO, SiO/sub x/, MgO) deposition at low substrate temperature. To enhance film adhesion and composition in reactive magnetron sputtering, additional energy source is necessary to dissociate the reactive gas molecules and to ionize the depositing particles for easier energy control.
Keywords :
adhesion; flat panel displays; indium compounds; liquid crystal displays; magnesium compounds; organic light emitting diodes; plasma displays; silicon compounds; sputter deposition; ITO; InSnO; LCD; MgO; OLED; PDP; SiO; film adhesion; flat panel displays; large area ICP assisted inline magnetron sputtering system; reactive magnetron sputtering; Atmospheric-pressure plasmas; Flat panel displays; Plasma materials processing; Plasma properties; Rough surfaces; Sputtering; Surface cleaning; Surface contamination; Surface roughness; Surface treatment;
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
Print_ISBN :
0-7803-7911-X
DOI :
10.1109/PLASMA.2003.1228732
