Characteristics of an atmospheric pressure plasma and its application to FPD fabrication processes

Author

Jae Hwack Pyo ; Yoon-Suk Oh ; Tae Ki Lee

Author_Institution

SE Plasma Inc., Kyunggi, South Korea

fYear

2003

fDate

5-5 June 2003

Firstpage

230

Abstract

Summary form only given, as follows. Recently, applicability of an atmospheric pressure plasma to the flat panel display, (FPD) fabrication processes has been studied. The issues include damages of metal patterns formed on glass substrates caused by intense electric field around the discharges, as well as a problem of the production of stable discharges suitable, for the large-area glass processings. In this study, we investigate the discharge characteristics of an atmospheric pressure plasma and its effects on the electrical damages to the metal-patterned glass.

Keywords

flat panel displays; plasma displays; plasma materials processing; 1 atm; FPD fabrication processes; atmospheric pressure plasma; electrical damage; flat panel display; glass substrates; intense electric field; large-area glass processings; metal patterns; Atmospheric-pressure plasmas; Electrodes; Electron emission; Fabrication; Glass; Plasma applications; Plasma displays; Plasma properties; Plasma stability; Substrates;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on

Conference_Location

Jeju, South Korea

ISSN

0730-9244

Print_ISBN

0-7803-7911-X

Type

conf

DOI

10.1109/PLASMA.2003.1228735

Filename

1228735