Title :
Characteristics of an atmospheric pressure plasma and its application to FPD fabrication processes
Author :
Jae Hwack Pyo ; Yoon-Suk Oh ; Tae Ki Lee
Author_Institution :
SE Plasma Inc., Kyunggi, South Korea
Abstract :
Summary form only given, as follows. Recently, applicability of an atmospheric pressure plasma to the flat panel display, (FPD) fabrication processes has been studied. The issues include damages of metal patterns formed on glass substrates caused by intense electric field around the discharges, as well as a problem of the production of stable discharges suitable, for the large-area glass processings. In this study, we investigate the discharge characteristics of an atmospheric pressure plasma and its effects on the electrical damages to the metal-patterned glass.
Keywords :
flat panel displays; plasma displays; plasma materials processing; 1 atm; FPD fabrication processes; atmospheric pressure plasma; electrical damage; flat panel display; glass substrates; intense electric field; large-area glass processings; metal patterns; Atmospheric-pressure plasmas; Electrodes; Electron emission; Fabrication; Glass; Plasma applications; Plasma displays; Plasma properties; Plasma stability; Substrates;
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
Print_ISBN :
0-7803-7911-X
DOI :
10.1109/PLASMA.2003.1228735
