New Transistor Structure Optimization for 0.25/spl mu/m Cmos Technology

Author

Kang, L.G. ; Kang, Y.T. ; Roh, B.H. ; Kim, S.P. ; Ha, Y.W. ; Han, K.M. ; Hwang, C.G.

Author_Institution

R & D Center, Samsung Electronics, Korea

fYear

1991

fDate

28-30 May 1991

Firstpage

Lastpage

Keywords

Boron; CMOS process; CMOS technology; CMOSFETs; Digital signal processing; Implants; MOS devices; Space technology; Transistors; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1991. Digest of Technical Papers., 1991 Symposium on

Conference_Location

Oiso, Japan

Type

DOI

10.1109/VLSIT.1991.706002

Filename

706002

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