DocumentCode :
2014269
Title :
A novel wafer-level double side packaging and its high frequency performance
Author :
Xiao Chen ; Jiajie Tang ; Gaowei Xu ; Tie Li ; Le Luo
Author_Institution :
State Key Lab. of Transducer Technol., Shanghai Inst. of Microsyst. & Inf. Technol., Shanghai, China
fYear :
2013
fDate :
25-28 Feb. 2013
Firstpage :
994
Lastpage :
999
Abstract :
In this paper, a wafer-level System-in-Packaging structure using through silicon via (TSV) for integration on both sides of the silicon wafer is presented. It is composed of BCB/metal multilayers, high-resistivity silicon substrate with TSV. To reduce the transmission loss in microwave frequency, not only the high-resistivity silicon is used, but also a special TSV structure with 6 grounded shielding vias around the core via are adopted. Microstrip line (MSL) is used to transmit high-frequency signal on package plane together with the low permittivity intermediate dielectric polymer, BCB. Descriptions on the interconnection structure and the fabrication process are included. The microwave measurement result of the MSL connected by TSVs is measured up to 35GHz. The results of both the simulation and the measurement are presented.
Keywords :
integrated circuit interconnections; microstrip lines; microwave integrated circuits; permittivity; polymers; system-in-package; three-dimensional integrated circuits; wafer level packaging; BCB-metal multilayers; MSL; Si; TSV structure; core via; fabrication process; grounded shielding; high-frequency signal; high-resistivity silicon substrate; interconnection structure; low permittivity intermediate dielectric polymer; microstrip line; microwave frequency; microwave measurement; package plane; silicon wafer; through silicon via; transmission loss; wafer-level double side packaging; wafer-level system-in-packaging structure; Fabrication; MMICs; Metals; Microwave measurement; Silicon; Substrates; Through-silicon vias; TSV; high frequency performance; wafer-level double side packaging;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Industrial Technology (ICIT), 2013 IEEE International Conference on
Conference_Location :
Cape Town
Print_ISBN :
978-1-4673-4567-5
Electronic_ISBN :
978-1-4673-4568-2
Type :
conf
DOI :
10.1109/ICIT.2013.6505807
Filename :
6505807
Link To Document :
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