Title :
Generation of enhanced pulsed electron beams by a pulse charge mode multi-gap pseudospark for material processing
Author :
Kwon, Y.K. ; Nam, S.H. ; Park, S.S. ; Kim, S.H. ; Heo, H. ; Han, Y.J.
Author_Institution :
Accelerator Lab., Pohang Inst. of Sci. & Technol., South Korea
Abstract :
Summary form only given, as follows. An intense pulsed electron beam produced by a pseudospark discharge has been used for material processing. Such intense electron beams can be produced with high efficiency by a pulse charge mode pseudospark discharge. In this work, we experimentally investigated a pulse charge mode to generate enhanced pulsed electron beam from a 10-gap pseudospark device.
Keywords :
electron beams; electron sources; plasma materials processing; sparks; 10-gap pseudospark device; enhanced pulsed electron beams generation; material processing; pulse charge mode multi-gap pseudospark; Argon; Delay effects; Electron accelerators; Electron beams; Induction generators; Laboratories; Magnetic fields; Materials processing; Pulse generation; Surface emitting lasers;
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
Print_ISBN :
0-7803-7911-X
DOI :
10.1109/PLASMA.2003.1228758
