Title :
Flash Evaporated Thin Films of Bismuth Telluride
Author :
Miyazaki, Koji ; Shirakawa, Toshiteru ; Tsukamoto, Hiroshi
Author_Institution :
Dept. of Biol. Functions & Eng., Kyushu Inst. of Technol., Fukuoka
Abstract :
In this study, thermoelectric thin films are deposited on glass plates by using a flash evaporation method. We evaporated fine powders of 20% Bi2Te3-80% Sb2Te3 as a p-type and those of 90% Bi2Te3-10% Bi2Se3 as an n-type. We measured thermoelectric properties, such as Seebeck coefficient, alpha, the electrical resistivity, rho, and thermal conductivity, lambda, at room temperature. Flash evaporated p-type thin films show high values of thermoelectric properties: alpha = 199 muV/K, and rho = 14 mOmegamiddotcm at 300 K, and the n-type thin films show alpha = -30 muV/K, and rho = 3 mOmegamiddotcm. The fabricated thin films are annealed at 200 to 400 degC for 1 hour in argon for the improvement of the thermoelectric properties. The electrical resistivity of the p-type thin films reduces as annealing temperature increases, and it reaches 1.8 mOmegamiddotcm at annealing temperature of 400 degC. Seebeck coefficient of the thin films reaches 218 muV/K at annealing temperature of 300 degC. On the other hand, the electrical resistivity of the n-type thin films reduces to 2 mOmegamiddotcm at annealing temperature of 350 degC, and Seebeck coefficient of the thin films increases to -163 muV/K at annealing temperature of 300 degC. The measured thermal conductivity of an n-type thin film annealed at 200 degC is 1.2 W/(mmiddotK). EPMA measurements and SEM observations are carried out to consider the mechanisms of improvements of thermoelectric properties
Keywords :
Seebeck effect; annealing; bismuth compounds; electrical resistivity; electron probe analysis; scanning electron microscopy; tellurium compounds; thermal conductivity; thin films; vacuum deposition; 1 hour; 200 to 400 C; 300 K; Bi2Te3; EPMA; SEM; Seebeck coefficient; annealing; bismuth telluride; electrical resistivity; electron probe microanalysis; flash evaporated thin films; flash evaporation method; n-type thin films; p-type thin films; scanning electron microscopy; thermal conductivity; thermoelectric property; thermoelectric thin films; Annealing; Bismuth; Conductivity measurement; Electric resistance; Sputtering; Tellurium; Temperature; Thermal conductivity; Thermoelectricity; Transistors;
Conference_Titel :
Thermoelectrics, 2006. ICT '06. 25th International Conference on
Conference_Location :
Vienna
Print_ISBN :
1-4244-0811-3
Electronic_ISBN :
1094-2734
DOI :
10.1109/ICT.2006.331390