Title :
Measurement and kinetic analysis of ozone and OH radicals in pulsed corona discharge plasma
Author :
Ono, R. ; Oda, T.
Author_Institution :
Dept. of Electr. Eng., Univ. of Tokyo, Japan
Abstract :
Summary form only given, as follows. The generation and dynamic behavior of ozone and OH radicals are observed in pulsed corona discharge plasma under a humid-air environment at atmospheric pressure. Ozone is measured by the ultraviolet (UV) laser absorption method and OH radical is measured by the laser-induced fluorescence (LIF) method. For OH excitation and for the UV source in ozone measurement, a tunable KrF excimer laser (248 nm) is used.
Keywords :
corona; free radicals; measurement by laser beam; ozone; plasma diagnostics; KrF; O/sub 3/; OH; OH radicals; atmospheric pressure; humid-air environment; laser-induced fluorescence; ozone; pulsed corona discharge plasma; tunable KrF excimer laser; ultraviolet laser absorption method; Atmospheric measurements; Atmospheric-pressure plasmas; Corona; Electromagnetic wave absorption; Fault location; Kinetic theory; Optical pulse generation; Plasma measurements; Plasma sources; Pulse measurements;
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
Print_ISBN :
0-7803-7911-X
DOI :
10.1109/PLASMA.2003.1228777
