Title :
Effects of Sizing, Alignment and Defects on Projection Printing with Phase-Shifting Masks
Author :
Pfau, A.K. ; Oldham, W.G. ; Neureuther, A.R.
Author_Institution :
Electronics Research Laboratory, University of California
Keywords :
Analytical models; Bars; Chromium; Etching; Ice; Laboratories; Optical microscopy; Phased arrays; Printing; Resists;
Conference_Titel :
VLSI Technology, 1991. Digest of Technical Papers., 1991 Symposium on
Conference_Location :
Oiso, Japan
DOI :
10.1109/VLSIT.1991.706006
