ECR plasma-assisted deposition of Pb phthalocyanine thin films

Author

Aliev, Vladimir Sh ; Badmaeva, Irena A.

Author_Institution

Inst. of Semicond. Phys., SB RAS, Novosibirsk, Russia

fYear

2010

fDate

June 30 2010-July 4 2010

Firstpage

21

Lastpage

24

Abstract

The effect of Ar low-temperature electron cyclotron resonance plasma on a growth of lead phthalocyanine films has been investigated by means of RHEED, AFM and IR spectroscopy. It has been found that at low intensity of the plasma assisting the films are subjected to a structural transformation that are similar a vacuum annealing. As the intensity of the assisting is increased, the growth of polymer matrix and an increase in shares of crystalline phase in the films have been observed.

Keywords

annealing; atomic force microscopy; cyclotron resonance; infrared spectra; lead compounds; organic semiconductors; organometallic compounds; plasma deposited coatings; plasma deposition; reflection high energy electron diffraction; semiconductor growth; semiconductor thin films; solid-state phase transformations; AFM; Ar low-temperature electron cyclotron resonance plasma effects; ECR plasma-assisted deposition; IR spectroscopy; Pb phthalocyanine thin films; RHEED; atomic force microscopy; crystalline phase; infrared spectroscopy; plasma intensity; polymer matrix growth; reflection high-energy electron diffraction; structural transformation; vacuum annealing; Atmospheric measurements; Atomic measurements; Heating; Particle measurements; Voltage measurement; ECR; Organic semiconductors; metal phthalocyanines;

fLanguage

English

Publisher

ieee

Conference_Titel

Micro/Nanotechnologies and Electron Devices (EDM), 2010 International Conference and Seminar on

Conference_Location

Novosibirsk

Print_ISBN

978-1-4244-6626-9

Type

conf

DOI

10.1109/EDM.2010.5568682

Filename

5568682