Title :
ECR plasma-assisted deposition of Pb phthalocyanine thin films
Author :
Aliev, Vladimir Sh ; Badmaeva, Irena A.
Author_Institution :
Inst. of Semicond. Phys., SB RAS, Novosibirsk, Russia
fDate :
June 30 2010-July 4 2010
Abstract :
The effect of Ar low-temperature electron cyclotron resonance plasma on a growth of lead phthalocyanine films has been investigated by means of RHEED, AFM and IR spectroscopy. It has been found that at low intensity of the plasma assisting the films are subjected to a structural transformation that are similar a vacuum annealing. As the intensity of the assisting is increased, the growth of polymer matrix and an increase in shares of crystalline phase in the films have been observed.
Keywords :
annealing; atomic force microscopy; cyclotron resonance; infrared spectra; lead compounds; organic semiconductors; organometallic compounds; plasma deposited coatings; plasma deposition; reflection high energy electron diffraction; semiconductor growth; semiconductor thin films; solid-state phase transformations; AFM; Ar low-temperature electron cyclotron resonance plasma effects; ECR plasma-assisted deposition; IR spectroscopy; Pb phthalocyanine thin films; RHEED; atomic force microscopy; crystalline phase; infrared spectroscopy; plasma intensity; polymer matrix growth; reflection high-energy electron diffraction; structural transformation; vacuum annealing; Atmospheric measurements; Atomic measurements; Heating; Particle measurements; Voltage measurement; ECR; Organic semiconductors; metal phthalocyanines;
Conference_Titel :
Micro/Nanotechnologies and Electron Devices (EDM), 2010 International Conference and Seminar on
Conference_Location :
Novosibirsk
Print_ISBN :
978-1-4244-6626-9
DOI :
10.1109/EDM.2010.5568682
