Title :
Automatic Pattern Generation System for Phase Shifting Mask
Author :
Hirai, Y. ; Matsuoka, K. ; Hashimoto, K. ; Nomura, N.
Author_Institution :
Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd., Japan
Keywords :
Design automation; Fabrication; Flowcharts; Lithography; Manuals; Phased arrays; Random access memory; Resists; Very large scale integration; Wiring;
Conference_Titel :
VLSI Technology, 1991. Digest of Technical Papers., 1991 Symposium on
Conference_Location :
Oiso, Japan
DOI :
10.1109/VLSIT.1991.706007
