Title :
Fundamental space radiation interactions in new nanoscale materials
Author :
Song, S.P. ; Jacobs, Bjorn ; Ayres, V.M. ; Crimp, M.A. ; Ronningen, R.M. ; Zeller, A.F.
Author_Institution :
Dept. of Electr. & Comput. Eng., Michigan State Univ., East Lansing, MI, USA
Abstract :
Summary form only given, as follows. Space exploration is entering a new era, with the advent of new micro space probes, and the increasing use of miniaturized equipment. However, it is well documented that silicon micron and sub-micron electronics based on diffusive transport through a channel are degraded or damaged by space radiation environments that disrupt the channel. This situation can be expected to deteriorate with the increasing use of microprobes that are less shielded from the space environment. A switch to new nanoelectronics may obviate several of the problems encountered in micron and sub-micron silicon electronics. At the nanoscale, current transport becomes ballistic, meaning wavelike, due to quantum confinement. The US is planning to deploy, in space, electronic devices constructed from newly developed silicon nanowire and carbon nanotube technologies. Therefore, it is important to begin a program to uncover fundamental radiation damage issues and their effects on ballistic transport in these new nanoscale material components. We will present recent research results on the interaction of simulated space radiation environments with silicon nanowires and carbon nanotubes.
Keywords :
carbon nanotubes; elemental semiconductors; nanowires; radiation effects; radiation hardening (electronics); silicon; C; Si; Si nanowires; carbon nanotubes; space radiation interactions; Carbon nanotubes; Degradation; Nanoelectronics; Nanostructured materials; Potential well; Probes; Silicon; Space exploration; Space technology; Switches;
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
Print_ISBN :
0-7803-7911-X
DOI :
10.1109/PLASMA.2003.1228802