DocumentCode
2015856
Title
Large scale arrays of microdischarge devices fabricated in Si
Author
Park, Sung-Jin ; Chen, Kuo-Feng ; Eden, J.G.
Author_Institution
Dept. of Electr. & Comput. Eng., Illinois Univ., Urbana, IL, USA
Volume
1
fYear
2004
fDate
7-11 Nov. 2004
Firstpage
256
Abstract
In this paper, the design and performance of novel AC type silicon microdischarge devices and arrays. We have fabricated, by MEMS and VLSI fabrication processes, microdischarge devices having cavity widths in the 10 -100 μm range and incorporating a metal/dielectrics/Si structure.
Keywords
VLSI; elemental semiconductors; glow discharges; metal-insulator boundaries; micro-optics; microcavities; micromechanical devices; optical arrays; optical fabrication; plasma devices; silicon; 10 to 100 mum; AC type silicon microdischarge device arrays; MEMS; Si; VLSI; metal/dielectrics/Si structure; Dielectric devices; Electrodes; Large-scale systems; Optical arrays; Optical devices; Optical saturation; Plasma applications; Plasma devices; Silicon; Stimulated emission;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Society, 2004. LEOS 2004. The 17th Annual Meeting of the IEEE
Print_ISBN
0-7803-8557-8
Type
conf
DOI
10.1109/LEOS.2004.1363208
Filename
1363208
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