Title :
3D Lithography, Etching, and Deposition Simulation (Sample-3D)
Author :
Scheckler, E.W. ; Toh, K.K.H. ; Hoffstetter, D.M. ; Neureuther, A.R.
Author_Institution :
Electronics Research Laboratory, University of California
Keywords :
Circuit simulation; Computational efficiency; Computational modeling; Etching; Lithography; Optical surface waves; Resists; Semiconductor device modeling; Surface topography; Topology;
Conference_Titel :
VLSI Technology, 1991. Digest of Technical Papers., 1991 Symposium on
Conference_Location :
Oiso, Japan
DOI :
10.1109/VLSIT.1991.706008
