Title :
Route to suppress NO/sub x/ of exhaust by partial oxidation of gasoline in plasma process
Author :
Yin yong xiang ; Dai xiao yan ; Li Juan ; Shang Shu yong
Author_Institution :
Sch. of Chem. Eng., Sichuan Univ., Chengdu, China
Abstract :
Summary form only given, as follows. NO/sub x/, an acidifying compound emitted from exhaust gases of motor vehicles, contributes to the formation of worldwide acid rain and becomes one of the main pollution sources in cities. Numerous attempts have been made to develop methods to control NO/sub x/ emission from motor vehicles. In this study a new concept of reducing NO/sub x/ in vehicle exhaust is introduced thanks to plasma processing.
Keywords :
molecule-molecule reactions; nitrogen compounds; oxidation; plasma applications; plasma chemistry; reduction (chemical); NO; NO/sub 2/; NO/sub x/ emission; exhaust gases; motor vehicles; plasma process; pollution sources; Atomic measurements; Oxidation; Petroleum; Plasma chemistry; Plasma sources; Pollution; Power generation; Surface contamination; Surface treatment; Vehicles;
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
Print_ISBN :
0-7803-7911-X
DOI :
10.1109/PLASMA.2003.1228817